Method and apparatus for drying a substrate
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United States of America Patent
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Issued Date -
Jan 22, 2004
app pub date -
Mar 24, 2003
filing date -
Sep 4, 1998
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method and apparatus for drying a disk-shaped substrate. The substrate is typically a substrate used for the manufacture of magnetic disks, and has a centrally located opening. The substrate is lowered into a liquid bath by a first holder, which also becomes immersed in the bath. The first holder lifts the substrate until the substrate extends partially out of contact with the liquid. A second, dry holder grabs a dry portion of the substrate that extends out of the bath, and continues to lift the substrate out of contact with the liquid. In one embodiment, different portions of the substrate are lifted past the surface of the liquid at different speeds
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