Process for cleaning a glass-coating reactor using a reactive gas
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United States of America Patent
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Feb 22, 2005
Grant Date -
Jan 22, 2004
app pub date -
Jul 22, 2002
filing date -
Jul 22, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A process for cleaning a glass-coating reactor includes: (a) providing the reactor to be cleaned, wherein the reactor contains a glass substrate within a chamber and the chamber has an internal surface coated with at least one substance selected from the group consisting of Si.sub.3 N.sub.4 or SiO.sub.2 ; (b) terminating a flow of a deposition gas to the reactor; (c) adding to the reactor at least one cleaning gas to react with the at least one substance to form at least one volatile product; and (d) removing from the reactor the at least one volatile product.
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