PLASMA CVD DEVICE
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United States of America Patent
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Issued Date -
Nov 6, 2003
app pub date -
Dec 23, 1998
filing date -
Jan 5, 1998
priority date (Note) -
Abandoned
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Abstract
It is an object of the present invention to provide a plasma CVD device in which it is possible to inhibit the formation of particles resulting from the adhesion of reaction by-products of poor adhesive strength around the upper electrode. The plasma CVD device has a vacuum container 200, an upper electrode 210 and a lower electrode 220. The edge of the gas dispersion plate 213 of the upper electrode 210 is formed in the shape of an upturned bowl, the edge of which extends below the upper surface of the treatment substrate W mounted on the substrate-mounting surface 221 of the lower electrode 220.
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