Composition of a resist stripper using electrolytic material with high equivalent conductivity in an aqueous solution
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United States of America Patent
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Issued Date -
Oct 23, 2003
app pub date -
Jul 5, 2002
filing date -
Apr 18, 2002
priority date (Note) -
Abandoned
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Abstract
Disclosed is a composition of resist stripper, which is advantageous in light of excellent strippability for residual resists after etching and ashing processes, and superior corrosion resistance to a metal film or a substrate formed with an inorganic material film. The stripping composition comprises 0.5-25 wt % of an electrolytic material having an equivalent conductivity of 300 .OMEGA..sup.-1cm.sup.2equiv.sup.-1 or higher in 0.001 N aqueous solution at 18.degree. C., 60.0-99.4 wt % of water and 0.1-25.0 wt % of a corrosion inhibitor.
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