X-ray monochromator and x-ray fluorescence spectrometer using the same
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United States of America Patent
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Issued Date -
Sep 11, 2003
app pub date -
Feb 4, 2003
filing date -
Mar 5, 2002
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
To provide an X-ray monochromator capable of sufficiently removing the harmful X-rays while the intensity of the main reflected line can be sufficiently maintained, an X-ray monochromator 4 is formed by depositing a plurality of layer pairs on a substrate 4c and each being made up of a reflecting layer 4a and a spacer layer 4b, with first and second multilayered films 4e1 and 4e2 including one or a plurality of layer pairs having a predetermined periodic length d, wherein so that of X-rays reflected from the first multilayered film 4e1 adjacent the substrate 4c, the X-rays of a desired energy can be removed by interference with X-rays reflected by the second multilayered film 4e2 remote from the substrate 4c, the predetermined periodic length d2, the material for the reflecting layers 4a or the material for the spacer layers 4b in the second multilayered film 4e2 are different from those in the first multilayered film 4e1 and, also, the second multilayered film 4e2 has a properly chosen number of the layer pairs.
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