Vapor deposition of dihalodialklysilanes
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United States of America Patent
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Issued Date -
Aug 28, 2003
app pub date -
Feb 28, 2002
filing date -
Feb 28, 2002
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Abandoned
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Abstract
Coatings of dialkylsilyloxy groups are applied to water-wettable surfaces by chemical vapor deposition using dihalodialkylsilanes with short-chain alkyl groups. Some of the surfaces which will benefit from the application of these coatings are hydroxyl-terminated silicon surfaces of microelectromechanical systems, nanoelectromechanical systems, and biomicroelectromechanical systems, while surfaces of other chemistries will benefit as well. When applied to a microstructure on an MEMS surface, the coating reduces stiction in the microstructure. The use of the vapor phase as a deposition medium facilitates the deposition process and permits close control over the reaction conditions and the characteristics of the resulting coating.
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