X-ray fluorescence spectrometer for semiconductors

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United States of America Patent

APP PUB NO 20030142781A1
SERIAL NO

10353964

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Abstract

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To provide an X-ray fluorescence spectrometer capable of analyzing a semiconductor sample at inexpensive costs non-invasively without incurring damage to the patterned circuits on the semiconductor sample, the X-ray fluorescence spectrometer includes a point source of primary X-rays 3a for emitting primary X-rays B1 used to irradiate a semiconductor sample 1 having circuit patterned areas 1a and scribe line 1b so as to separate the neighboring circuit patterned areas 1a, and a detecting unit 5 for detecting fluorescent X-rays emitted from the semiconductor sample 1. The X-ray fluorescence spectrometer also includes a focusing element 6 for focusing the primary X-rays B1 to form a spot irradiation region of a diameter not greater than 50 .mu.m, a sample recognizing unit 12 for recognizing the scribe line on the semiconductor sample as a target site of measurement, and a positioning mechanism 15 for moving the scribe line 1b on the semiconductor sample to a measurement position where the primary X-rays B1 are focused.

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Patent Owner(s)

Patent OwnerAddress
RIGAKU INDUSTRIAL CORPORATIONTAKATSUKI-SHI OSAKA-FU 569-1146

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kawahara, Naoki Osaka, JP 15 153
Kohno, Hisayuki Osaka, JP 6 87
Ogura, Keisuke Osaka, JP 4 54
Yamada, Takashi Osaka, JP 581 7758

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