Chemical vapor deposition vaporizer
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United States of America Patent
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N/A
Issued Date -
Jun 26, 2003
app pub date -
Dec 4, 2002
filing date -
Dec 4, 2001
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A Chemical Vapor Deposition (CVD) vaporizer comprising: a liquid supply assembly having an environment supporting a liquid state for a plurality of precursor components of a liquid precursor blend; a venturi operative to atomize said liquid precursor blend; a vaporization chamber, located proximate to said liquid supply assembly and said venturi, having an environment supporting a vapor state for said plurality of precursor components; and a thermal barrier located between said liquid supply assembly and said vaporization chamber enabling preservation of a large temperature disparity between said liquid supply assembly and said proximately located vaporization chamber.
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