High fill factor CMOS image sensor

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United States of America Patent

APP PUB NO 20030107107A1
SERIAL NO

10068228

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Abstract

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A CMOS image sensor structure for improving the fill factor due to design rule limitations of a conventional image sensor that incorporates a photo diode and three N-type transistors. In a first embodiment, two N-type transistors are changed to P-type transistors and the P-type transistors are formed directly within the N-well of the photo diode. In a second embodiment, the other reset N-type transistor is changed to a reset diode and the reset diode is also formed directly within the N-well of the photo diode. In a third embodiment, the reset diode and the source follower transistor are implemented using a single transistor. In addition, the output selection transistors inside all three types of CMOS image sensor structures may be deleted to increase the fill factor even further.

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Patent Owner(s)

Patent OwnerAddress
TWIN HAN TECHNOLOGY CO LTD3F NO 179 YUNG-CHI ROAD TAIPEI R O C

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Hsien-Chun Chilung, TW 21 115
King, Ya-Chin Chungli, TW 91 428

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