Method and apparatus for cleaning substrates
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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N/A
Issued Date -
Jun 12, 2003
app pub date -
May 30, 2002
filing date -
Jul 6, 2001
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An ultrasonic vibrating apparatus and an ultrasonic cleaning apparatus capable of permitting ultrasonic cleaning of a wafer to be carried out using an existing cleaning tank and while keeping the object immersed in cleaning liquid. An ultrasonic wave is irradiated to a cleaned object while keeping it immersed in cleaning liquid stored in a cleaning tank formed with an upper opening. A vibrating plate is securely mounted thereon with an ultrasonic transducer through a wave transmission element and arranged so as to close the upper opening of the cleaning tank in a cover-like manner. The vibrating plate is so arranged that a vibrating surface thereof downwardly faces and is immersed in the cleaning liquid.
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