Strain of Streptomyces griseus
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United States of America Patent
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Jan 18, 2005
Grant Date -
Apr 10, 2003
app pub date -
Mar 12, 2002
filing date -
Jul 9, 1998
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Abstract
A microorganism strain which is Streptomyces griseus FERM BP-5420 and processes for preparing compounds by cultivating such microorganism strain.
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
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SEQUELLA INC | 9610 MEDICAL CENTER DRIVE SUITE 200 ROCKVILLE MD 20850 |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Arai, Masatoshi | Nishitokyo, JP | 248 | 2096 |
# of filed Patents : 248 Total Citations : 2096 | |||
Inukai, Masatoshi | Matsudo, JP | 9 | 8 |
# of filed Patents : 9 Total Citations : 8 | |||
Kizuka, Masaaki | Tsuchiura, JP | 4 | 3 |
# of filed Patents : 4 Total Citations : 3 | |||
Miyakoshi, Shunichi | Hachioji, JP | 3 | 21 |
# of filed Patents : 3 Total Citations : 21 | |||
Ogawa, Yasumasa | Iwaki, JP | 6 | 70 |
# of filed Patents : 6 Total Citations : 70 | |||
Takatsu, Toshio | Nishitokyo, JP | 7 | 20 |
# of filed Patents : 7 Total Citations : 20 |
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text
US Patent Application No: 2003/0069,204
Strain of streptomyces
Abstract
The present invention relates to ester, ether and N-alkylcarbamoyl derivatives of compound (Ia) and pharmaceutically acceptable salts thereof. These compounds exhibit excellent antibacterial activity and are useful for the treatment or prevention of bacterial infections.1 ![]()
(wherein R1 is a hydrogen atom or a methyl group; R2 a is a hydrogen atom, a protecting group for a hydroxy group, or a methyl group; R3 is a hydrogen atom or a protecting group for a hydroxy group; R4 a is a hydrogen atom, a hydroxy group or a protected hydroxy group; R5 is a hydrogen atom or a protecting group for a hydroxy group; and X is a methylene group or a sulfur atom). The invention also includes compounds which are related to the aforeidentified compounds.
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