Resist stripper, resist stripping method, and thin film circuit device formation method
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United States of America Patent
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Issued Date -
Apr 3, 2003
app pub date -
Mar 27, 2002
filing date -
Sep 28, 2001
priority date (Note) -
Abandoned
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Abstract
A resist stripper has a composition including a highly polar solvent containing at least one member selected from the group consisting of N-methyl-pyrrolidone(N-methyl-2-pyrrolidone), N,N-dimethyl-acetamide, dimethyl-formamide, and N,N-methyl-formamide, and an amine compound soluble in water. A resist film used and its modified hardened portion are stripped and removed by this resist stripper.
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