High flow rate transportable UHP gas supply system
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United States of America Patent
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Sep 2, 2003
Grant Date -
Apr 3, 2003
app pub date -
Sep 28, 2001
filing date -
Sep 28, 2001
priority date (Note) -
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Abstract
A high flow rate, transportable, ultra high purity gas vaporization and supply system is provided which includes a vessel suitable for carrying large quantities of a liquefied gas, valves to operate with liquid or gas phases, a loading/unloading unit disposed on the vessel for loading and unloading the liquefied gas to be supplied, and a heater containing heating elements permanently positioned on the vessel to supply energy into the liquefied gas. The heater causes the liquefied gas to be supplied through the loading/unloading unit as a gas. A heater controller is also provided which uses process variables feedback for regulating the heating elements to maintain and regulate gas output.
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