Method for forming a micro-pattern on a substrate by using capillary force
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United States of America Patent
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N/A
Issued Date -
Apr 3, 2003
app pub date -
Sep 28, 2001
filing date -
Sep 25, 2001
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
In a method for forming a micro-pattern on a substrate by employing a mold having a predetermined pattern structure, a mold having a predetermined pattern structure containing a recessed portion and a protruded portion is prepared. A polymer material is deposited on the substrate. Then the protruded portion of the mold is controlled to be in contact with the polymer material and the polymer material in contact with the protruded portion of the mold is incorporated into an empty space of the recessed portion thereof by using capillary force thereof, thereby removing the polymer material in contact with the protruded portion of the mold. Thereafter, a portion of the top surface of the substrate is exposed by detaching the mold to thereby form a polymer micro-pattern on the substrate.
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