Substrate for fluorescence analysis
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United States of America Patent
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Issued Date -
Mar 20, 2003
app pub date -
Jan 14, 2002
filing date -
Jan 12, 2001
priority date (Note) -
Abandoned
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Abstract
The present invention relates to an improved substrate for use in detection of fluorescence. More specifically the improved substrate exhibits a supported surface layer of silicon dioxide on a silicon support material, on another solid support material, or on a silicon layer supported on another solid support material. The inventive substrate allows for a significantly higher sensitivity to be obtained when used in fluorescence analysis. The invention also relates to a method of preparing the inventive substrate, which substrate in one embodiment of the invention takes the form of silicon a slide exhibiting an oxidized surface. The invention also relates to the application of the inventive substrate in microarray analysis.
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