Surface distortion compensated photolithography
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United States of America Patent
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app pub date -
Dec 28, 2001
filing date -
Jul 31, 2001
priority date (Note) -
Abandoned
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Abstract
A distortion compensation system for use in an imaging device such as a photolithography system is described. The system projects a plurality of image portions onto a plurality of portions of a subject. The system includes a plurality of light-distance modulators corresponding to the plurality of image portions and a mechanical manipulator for individually manipulating each of the light-distance modulators. In this way, any distortion in the subject is compensated by the individual manipulation of the light-distance modulators.
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