High throughput hybrid deposition system and method using the same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Jan 2, 2003
app pub date -
Jan 16, 2002
filing date -
Jun 29, 2001
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A deposition system includes at least one first load lock chamber, at least one deposition chamber attached to the first load lock chamber, the at least one deposition chamber having a plurality of deposition sources disposed circumferentially about sidewalls of the deposition chamber, at least one second load lock chamber attached to the deposition chamber, a plurality of gas inlet ports and vacuum line ports disposed on each of the first and second load lock chambers and the deposition chamber, and a plurality of rotatable deposition pallets, at least one deposition pallet is disposed within the deposition chamber and at least one deposition pallet is disposed in one of the first and second load lock chambers, wherein the at least one deposition pallet disposed in one of the first and second load lock chambers laterally shifts into the deposition chamber when the at least one deposition pallet disposed in the deposition chamber laterally shifts from the deposition chamber into another one of the first and second load lock chambers.
First Claim
Other Claims data not available