Thermal generation of mask pattern
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United States of America Patent
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Jun 29, 2004
Grant Date -
Jan 2, 2003
app pub date -
Jun 30, 2001
filing date -
Jun 30, 2001
priority date (Note) -
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Abstract
A mask having a first region and a second region; the first region having a multilayer mirror over a substrate, the multilayer mirror having alternating layers of a first material and a second material, the first material having a high index of refraction, the second material having a low index of refraction; and the second region having a compound of the first material and the second material over the substrate.
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