Method for the production of gas- and liquid-impermeable layers on a substrate
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United States of America Patent
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Issued Date -
Jan 2, 2003
app pub date -
Jun 25, 2002
filing date -
Jun 28, 2001
priority date (Note) -
Abandoned
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Abstract
The invention relates to a method for the production on a substrate of gas- and liquid-impermeable layers, which have a relatively high elasticity. This elasticity is attained through the inclusion of carbon in a layer comprised of a metal or semiconductor oxide. In order to attain such an inclusion, a metal or semiconductor is ionized by means of an arc discharge. Subsequently, a reactive gas, for example O.sub.2, is introduced, with which the ionized metal or the ionized semiconductor forms an oxide. In addition, a carbon-containing gas is added, which releases its carbon such that on the substrate an oxide layer is formed, in which carbon is included.
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