Substrate processing apparatus, substrate processing system, and substrate conveying method

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United States of America Patent

APP PUB NO 20020182037A1
SERIAL NO

10091588

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Abstract

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A substrate processing apparatus for providing predetermined processing to wafers brought in through the load port door comprises in the front of the load port door a load port table on which a wafer carrier accommodating a plurality of wafers is placed, and a shield plate is provided so as to surround the load port table.

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Patent Owner(s)

Patent OwnerAddress
SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INCTSUKUBA-SHI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Seokhyun Seoul, KR 54 102
Kimoto, Shinyo Kyoto, JP 2 6
Muguruma, Terumi Kawasaki, JP 7 157
Nishi, Masahiro Tokyo, JP 35 363
Tokunaga, Kenji Tokyo, JP 28 487
Watanabe, Shinichi Ibaraki, JP 98 1961
Yamada, Yoshiaki Hyogo, JP 123 1889

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