Differential Cleaning for semiconductor wafers with copper circuitry
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United States of America Patent
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Issued Date -
Nov 21, 2002
app pub date -
May 21, 2001
filing date -
May 21, 2001
priority date (Note) -
Abandoned
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Abstract
The invention provides a method for differentially applying cleaning chemistries to a silicon wafer that has undergone a polishing process whether chemical mechanical polishing or polishing with a fixed abrasive material. In accordance with the invention, cleaning fluid with a specific chemistry designed for cleaning the front side of the wafer is applied to the front side; while different chemistry specifically selected for more effectively cleaning the rear side of the wafer is applied to that side. This application of different chemistries to the two sides of the wafer is referred to as 'differential cleaning'.
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