Method for cleaning polysilicon
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United States of America Patent
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N/A
Issued Date -
Nov 14, 2002
app pub date -
May 8, 2001
filing date -
May 8, 2001
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method for cleaning polysilicon comprises steps of cleaning solid or granular polysilicon with an aqueous solution of dissolved ozone, and of cleaning with hydrofluoric acid the polysilicon receiving the above cleaning based on an aqueous solution of dissolved ozone, wherein the above steps are executed once in this order, or the above steps are repeated once or more in this order. Subsequent to the last cleaning step using hydrofluoric acid, a still other step of cleaning the polysilicon with pure water and then drying it is preferably added. This method for cleaning polysilicon allows organic materials, particles and metal impurities adsorbed on the surface of polysilicon to be removed at a low cost, and to increase the freeing rate.
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