Photoresist compositions comprising polycyclic polymers with acid labile pendant groups

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20020136982A1
SERIAL NO

10079218

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.

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Patent Owner(s)

Patent OwnerAddress
THE B F GOODRICH COMPANY3925 EMBASSY PARKWAY AKRON OHIO 44313-1799

International Classification(s)

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  • 2002 Application Filing Year
  • G03F Class
  • 1277 Applications Filed
  • 505 Patents Issued To-Date
  • 39.55 % Issued To-Date

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Goodall, Brian L Akron, OH 59 1458
Jayaraman, Saikumar Cuyahoga Falls, OH 87 1079
Rhodes, Larry F Silverlake, OH 116 936
Shick, Robert A Strongsville, OH 21 445

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Patent Citation Ranking

  • 9 Citation Count
  • G03F Class
  • 1.72 % this patent is cited more than
  • 23 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges2443318364221101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8091 - 100100 +02.557.51012.51517.52022.52527.53032.53537.54042.54547.5

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