Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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N/A
Issued Date -
Jul 4, 2002
app pub date -
Jun 15, 2001
filing date -
Dec 29, 2000
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Silica grain of desired properties and size is created in a vacuum chamber. Fine silica powder is injected in the chamber or silica powder is formed in situ by combusting precursors. A plasma is formed centrally in the chamber to soften the silica powders so that they stick together and form larger grains of desired size. The grains are collected, doped, fused and flowed into tubes or rods. A puller pulls the tube or rod through a chamber seal into a lower connected vacuum chamber. The tube or rod is converted to rods and fibers or plates and bars in the connected chamber. Fused silica in a crucible tray is subjected to ultrasound or other oscillations for outgassing. Gases are removed by closely positioned vacuum ports.
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