On-site generation of ultra-high-purity buffered-HF and ammonium fluoride
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United States of America Patent
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Issued Date -
Jun 27, 2002
app pub date -
Dec 10, 2001
filing date -
Jan 7, 1994
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Abandoned
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Abstract
Provided is a novel method and system for preparing ultra-high-purity buffered-hydrofluoric acid or ammonium fluoride controlled concentration. The method comprises bubbling purified ammonia vapor into ultra-pure hydrofluoric acid. The inventive method and system can be used as an on-site subsystem in a semiconductor device fabrication facility for supplying the buffered-hydrofluoric acid and ammonium fluoride to points of use in the semiconductor device fabrication facility.
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