Removing metal ions from wastewater
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United States of America Patent
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N/A
Issued Date -
Jun 27, 2002
app pub date -
Oct 31, 2001
filing date -
Jul 10, 1998
priority date (Note) -
Abandoned
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Abstract
A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A chemical precipitation unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.
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