Low-loss waveguide and method of making same
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United States of America Patent
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Feb 1, 2005
Grant Date -
Mar 14, 2002
app pub date -
Jun 7, 2001
filing date -
Jul 10, 2000
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Abstract
A method of reducing the scattering losses that involves smoothing of the core/cladding interface and/or change of waveguide geometry in high refractive index difference waveguides. As an example, the SOI-based Si/SiO.sub.2 waveguides are subjected to an oxidation reaction at high temperatures, after the waveguide patterning process. By oxidizing the rough silicon core surfaces after the patterning process, the core/cladding interfaces are smoothened, reducing the roughness scattering in waveguides.
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