Method and system for adjusting the gap between a wafer and a top plate in a thin-film deposition process

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United States of America

PATENT NO 12266579
APP PUB NO 20230069081A1
SERIAL NO

17461004

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Abstract

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A thin-film deposition system includes a top plate positioned above a wafer and configured to generate a plasma during a thin-film deposition process. The system includes a gap sensor configured to generate sensor signals indicative of a gap between the wafer and the top plate. The system includes a control system configured to adjust the gap during the thin-film deposition process responsive to the sensor signals.

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Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDNO 8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Sheng-Chau Hsinchu, TW 132 593
Chou, Cheng-Hsien Hsinchu, TW 152 1038
Li, Sheng-Chan Hsinchu, TW 74 183
Tsai, Cheng-Yuan Hsinchu, TW 289 2706

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