Mask encapsulation to prevent degradation during fabrication of high aspect ratio features

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12266535
APP PUB NO 20220406610A1
SERIAL NO

17642918

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Abstract

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A tool and method for processing substrates by encapsulating a mask to protect from degradation during an etch-back to prevent a feature liner material from pinching off an opening during deposition-etch cycles used to fabricate high aspect ratio features with very tight critical dimension control.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Henri, Jon West Linn, US 68 10895
Reddy, Kapu Sirish Portland, US 28 437
Roberts, Francis Sloan Portland, US 6 64

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