Semiconductor processing tool and methods of operation

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12265336
APP PUB NO 20220350264A1
SERIAL NO

17446241

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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An exposure tool is configured to remove contaminants and/or prevent contamination of mirrors and/or other optical components included in the exposure tool. In some implementations, the exposure tool is configured to flush and/or otherwise remove contaminants from an illuminator, a projection optics box, and/or one or more other subsystems of the exposure tool using a heated gas such as ozone (O3) or extra clean dry air (XCDA), among other examples. In some implementations, the exposure tool is configured to provide a gas curtain (or gas wall) that includes hydrogen (H2) or another type of gas to reduce the likelihood of contaminants reaching the mirrors included in the exposure tool. In this way, the mirrors and one or more other components of the exposure tool are cleaned and maintained in a clean environment in which radiation absorbing contaminants are controlled to increase the performance of the exposure tool.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDHSINCHU

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Chun-Lin Zhubei, TW 54 184
Chang, Kai-Chieh Changhua, TW 49 138
Chen, Li-Jui Hsinchu, TW 306 606
Ho, Kai-Fa New Taipei, TW 11 15
Hsu, Che-Chang Taichung, TW 25 22
Liu, Heng-Hsin New Taipei, TW 158 281
Su, Yen-Shuo Hsinchu, TW 31 99

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