Optical proximity correction and photomasks
Number of patents in Portfolio can not be more than 2000
United States of America
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Apr 1, 2025
Grant Date -
Nov 30, 2023
app pub date -
Jul 30, 2023
filing date -
Jul 30, 2023
priority date (Note) -
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status (Latency Note)
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Abstract
A method includes receiving a layout for fabricating a mask, determining a plurality of target contours corresponding to a plurality of sets of lithographic process conditions, determining a modification to the layout, simulating the modification to the layout under the plurality of sets of lithographic process conditions to produce a plurality of simulated contours, determining a cost of the modification to the layout based on comparisons between the plurality of simulated contours and corresponding ones in the plurality of target contours, and providing the modification to the layout for fabricating the mask based at least in part on the cost being within a predetermined threshold.
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