Inverse lithography and machine learning for mask synthesis

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12265325
APP PUB NO 20230375916A1
SERIAL NO

18228509

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Abstract

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Techniques relating to synthesizing masks for use in manufacturing a semiconductor device are disclosed. These techniques include providing, by a processor, a design pattern for a semiconductor device as input to a trained machine learning (ML) model. The techniques further include performing, using the ML Model, a plurality of dilated convolutions relating to the design pattern, and inferring, using the ML model, one or more masks for use in manufacturing the semiconductor device, based on the plurality of dilated convolutions.

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Patent Owner(s)

  • SYNOPSYS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cecil, Thomas Chrisptopher Menlo Park, US 1 0
Poonawala, Amyn A Santa Clara, US 3 13
Shu, Jason Jiale San Jose, US 2 2

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