Pellicle for an EUV lithography mask and a method of manufacturing thereof

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12265323
APP PUB NO 20240094629A1
SERIAL NO

18516630

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Abstract

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A pellicle for an EUV photo mask includes a first layer; a second layer; and a main layer disposed between the first layer and second layer and including a plurality of nanotubes. At least one of the first layer or the second layer includes a two-dimensional material in which one or more two-dimensional layers are stacked. In one or more of the foregoing and following embodiments, the first layer includes a first two-dimensional material and the second layer includes a second two-dimensional material.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chao, Tzu-Ang Hsinchu, TW 19 14
Cheng, Chao-Ching Hsinchu, TW 148 545
Wang, Han Hsinchu, TW 213 1423

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