Reflective mask blank, and method for manufacturing reflective mask
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United States of America
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Apr 1, 2025
Grant Date -
Dec 22, 2022
app pub date -
May 31, 2022
filing date -
May 31, 2022
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Abstract
With respect to a reflective mask blank for a reflective mask used in EUV lithography using EUV light, the reflective mask blank including a substrate, a multilayer reflection film having a periodically laminated structure in which low-refractive index layers composed of a material containing molybdenum and high-refractive index layers are alternately laminated, a protection film, and an absorber film is provided. The low-refractive index layer consists of one or more of first low-refractive index sublayers, and one or more of second low-refractive index sublayers that have a different composition from a composition of the first low-refractive index sublayer.
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