Type of device(s) for automatically monitoring a coating and/or structure applied to a substrate with determination of reflective properties and/or geometric dimensions, and a corresponding method

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12264909
APP PUB NO 20230349692A1
SERIAL NO

17914284

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Abstract

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A material application and analysis device may comprise at least one analysis device for optically monitoring at least a first material application and a second material application, and a material application element for applying the second material application to a substrate provided with the first material application at least in sections. The material application element is arranged between a first radiation source and detection device assembly and a second radiation source and detection device assembly, wherein by the first radiation source and detection device assembly the first material application is detectable and wherein by the second radiation source and detection device assembly the second material application is detectable. Furthermore, first image data are processed and second image data are processed, and the processed first image data are evaluated with respect to a physical parameter and the processed second image data are evaluated with respect to a geometrical parameter.

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Patent Owner(s)

Patent OwnerAddress
QUISS QUALITAETS-INSPEKTIONSSYSTEME UND SERVICE GMBHLILIENTHALSTRASSE 5 PUCHHEIM 82178

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gruber, Bernhard Stockdorf, DE 18 53

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