Textile patterning for subtractively-patterned self-aligned interconnects, plugs, and vias

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12261057
APP PUB NO 20220157619A1
SERIAL NO

17592442

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Abstract

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Embodiments of the invention include methods of forming a textile patterned hardmask. In an embodiment, a first hardmask and a second hardmask are formed over a top surface of an interconnect layer in an alternating pattern. A sacrificial cross-grating may then be formed over the first and second hardmasks. In an embodiment, portions of the first hardmask that are not covered by the sacrificial cross-grating are removed to form first openings and a third hardmask is disposed into the first openings. Embodiments may then include etching through portions of the second hardmask that are not covered by the sacrificial cross-grating to form second openings. The second openings may be filled with a fourth hardmask. According to an embodiment, the first, second, third, and fourth hardmasks are etch selective to each other. In an embodiment the sacrificial cross-grating may then be removed.

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Patent Owner(s)

Patent OwnerAddress
TAHOE RESEARCH LTDBLANCHARDSTOWN CORPORATE PARK 2 PLAZA 255 SUITE 2A DUBLIN D15 YH6H

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bristol, Robert Lindsey Portland, US 6 39
Lin, Kevin Beaverton, US 166 1997
Myers, Alan M Beaverton, US 50 619

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