Apparatus and method of measuring uniformity based on pupil image and method of manufacturing mask by using the method
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United States of America
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Mar 25, 2025
Grant Date -
May 11, 2023
app pub date -
Jan 4, 2023
filing date -
Jan 4, 2023
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Abstract
An apparatus and method of measuring pattern uniformity, and a method of manufacturing a mask by using the measurement method are provided. The measurement apparatus includes a light source configured to generate and output light, a stage configured to support a measurement target, an optical system configured to transfer the light, output from the light source, to the measurement target supported on the stage, and a first detector configured to detect light reflected and diffracted by the measurement target, or diffracted by passing through the measurement target, wherein the first detector is configured to detect a pupil image of a pupil plane and to measure pattern uniformity of an array area of the measurement target on the basis of intensity of at least one of zero-order light and 1st-order light of the pupil image.
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