Chemical etch nonvolatile materials for MRAM patterning

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12256645
APP PUB NO 20220376174A1
SERIAL NO

17622167

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Abstract

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A method is provided. A substrate situated in a chamber is exposed to a halogen-containing gas comprising an element selected from the group consisting of silicon, germanium, carbon, titanium, and tin, and igniting a plasma to modify a surface of the substrate and form a modified surface. The substrate is exposed to an activated activation gas to etch at least part of the modified surface.

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Patent Owner(s)

  • LAM RESEARCH CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
El, Otell Ziad Leuven, BE 1 0
Fan, Yiwen Fremont, US 10 14
Lin, Ran Fremont, US 34 159
Mukherjee, Tamal Fremont, US 14 33
Pan, Yang Los Altos, US 310 4868
Tan, Samantha SiamHwa Newark, US 41 122
Yang, Wenbing Campbell, US 38 1271
Zhu, Zhongwei Sunnyvale, US 7 28

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