Apparatus for heating substrate and method thereof
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United States of America
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Mar 18, 2025
Grant Date -
Mar 10, 2022
app pub date -
Sep 1, 2021
filing date -
Sep 1, 2021
priority date (Note) -
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Abstract
An apparatus for heating a substrate includes: a stage including at least one resistance heater that heats the substrate placed thereon; a temperature detector for detecting a heating temperature of the substrate; a temperature calculator for calculating the heating temperature based on a resistance value of the at least one resistance heater; a power controller for performing a power control with respect to a first power to be supplied to the at least one resistance heater such that the heating temperature becomes close to a first preset temperature by switchably applying a phase control and a zero-cross control; and a controller for switching the power control of the power controller to the phase control or the zero-cross control.

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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
- TOKYO ELECTRON LIMITED
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Mase, Takahisa | Nirasaki, JP | 4 | 378 |
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