Apparatus for heating substrate and method thereof

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12256471
APP PUB NO 20220078888A1
SERIAL NO

17446667

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An apparatus for heating a substrate includes: a stage including at least one resistance heater that heats the substrate placed thereon; a temperature detector for detecting a heating temperature of the substrate; a temperature calculator for calculating the heating temperature based on a resistance value of the at least one resistance heater; a power controller for performing a power control with respect to a first power to be supplied to the at least one resistance heater such that the heating temperature becomes close to a first preset temperature by switchably applying a phase control and a zero-cross control; and a controller for switching the power control of the power controller to the phase control or the zero-cross control.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mase, Takahisa Nirasaki, JP 4 378

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