Method for forming an electrical contact and method for forming a semiconductor device

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12255068
APP PUB NO 20230005747A1
SERIAL NO

17774063

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Abstract

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A method for forming an electrical contact is provided. The method includes grinding a silicon carbide surface using a grinding disk which includes a grinding face containing nickel or a nickel compound, such that particles of the nickel or nickel compound from the grinding disk are embedded in the ground silicon carbide surface, and hardening the ground silicon carbide surface with the aid of a laser, such that at least some of the embedded nickel particles form a nickel silicide with silicon from the silicon carbide.

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Patent Owner(s)

  • 502 ROBERT BOSCH GMBH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Alsmeier, Jan-Hendrik Pfullingen, DE 10 2
Rodriguez, Alvarez Humberto Kornwestheim, DE 5 0

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