Gas purge systems for a laser source

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12253806
APP PUB NO 20220413402A1
SERIAL NO

17784948

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A laser source includes a laser chamber configured to generate a first laser beam. The laser source further includes an optical system coupled to the laser chamber and configured to receive the first laser beam and output an output laser beam. The laser source also includes a gas purge system. According to some aspects, the gas purge system is configured to supply a nitrogen gas into the optical system at a pressure less than atmospheric pressure. According to some aspects, the gas purge system is configured to supply a helium gas into the optical system.

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Patent Owner(s)

Patent OwnerAddress
CYMER LLC17075 THORNMINT COURT SAN DIEGO CA 92127

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Padmabandu, Gamaralalage G San Diego, US 12 322

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