Scatterometry overlay metrology with orthogonal fine-pitch segmentation

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United States of America

PATENT NO 12253805
APP PUB NO 20240053687A1
SERIAL NO

17885909

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Abstract

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An overlay metrology target may include grating-over-grating structures formed from a lower grating structure with a first coarse pitch in a first sample layer and an upper grating structure with a second coarse pitch in a second sample layer, where the upper and lower grating structures overlap on the sample. At least one of the upper grating structure or the lower grating structure may include features with a fine pitch smaller than a wavelength of an illumination beam and arranged to rotate first-order diffraction of the illumination beam associated with at least one of the first or second coarse pitches with respect to at least one of specular reflection from a top surface of the sample or zero-order diffraction from the one or more grating structures. Overlay between the first and second layers of the sample is determinable from an image of the grating structures based on the first-order diffraction.

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Patent Owner(s)

Patent OwnerAddress
KLA CORPORATIONONE TECHNOLOGY DRIVE MILPITAS CA 95035

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Levinski, Vladimir Nazareth Ilit, IL 106 1375
Manassen, Amnon Haifa, IL 128 1032
Negri, Daria Nesher, IL 36 316

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