Method for manufacturing semiconductor structure and semiconductor structure thereof
Number of patents in Portfolio can not be more than 2000
United States of America
Stats
-
Mar 11, 2025
Grant Date -
Oct 26, 2023
app pub date -
Apr 25, 2022
filing date -
Apr 25, 2022
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A semiconductor structure is provided. The semiconductor structure includes an interconnection structure, a first transistor, and a second transistor. The interconnection structure includes a first metal line layer, a second metal line layer and a third metal line layer arranged over one another. The first transistor includes a gate structure. The second transistor is disposed adjacent to the first transistor, and includes a source/drain structure. The gate structure of the first transistor is disposed over and electrically connected to the first metal line layer, and the source/drain structure of the second transistor is arranged below and electrically connected to the second metal line layer through the third metal line layer. A manufacturing method of a semiconductor structure is also provided.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully