Wet etch apparatus
Number of patents in Portfolio can not be more than 2000
United States of America
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Mar 11, 2025
Grant Date -
Dec 16, 2021
app pub date -
Aug 28, 2021
filing date -
Aug 28, 2021
priority date (Note) -
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Abstract
A wet etch apparatus includes a wafer chuck, a dispensing nozzle, a liquid etchant container, and an electric field generator. The dispensing nozzle is above the wafer chuck. The liquid etchant container is in fluid communication with the dispensing nozzle. The electric field generator is operative to generate an electric field across the wafer chuck. The electric field generator includes a first electrode and a second electrode spaced apart from the first electrode in a direction substantially perpendicular to a top surface of the wafer chuck, and the second electrode is an electrode plate above the wafer chuck.
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