Differential measurement system
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United States of America
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Mar 11, 2025
Grant Date -
May 18, 2023
app pub date -
Mar 9, 2021
filing date -
Mar 9, 2021
priority date (Note) -
In Force
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Abstract
A system for measuring the difference between a property of a first target and a property of a second target, the system comprising a first member and a second member, wherein the first member comprises a first pattern, and the speed of rotation of the first member is configured to be based on the property of the first target; and the second member comprises a second pattern wherein, the speed of rotation of the second member is configured to be based on the property of the second target, further wherein the first and second pattern are angularly-varying and are configured to generate an interference pattern by their interaction when the first and second members have a relative difference in their rotational speeds, the interference pattern being indicative of the magnitude of this difference.

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Patent Owner(s)
- ASML NETHERLANDS B.V.
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Aggarwal, Pulkit | Veldhoven, NL | 15 | 4 |
Steijns, Hubert Matthieu Richard | Veldhoven, NL | 4 | 40 |
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