Bubble defect reduction

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12248252
APP PUB NO 20220004103A1
SERIAL NO

17293000

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Abstract

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In some examples, a method of processing a substrate comprises applying a photoresist (PR) onto a surface of the substrate, pre-exposing the PR to ultra violet (UV) light before depositing or etching a metal oxide (MO) layer onto the PR, and depositing or etching a MO layer onto the PR subsequent to pre-exposing the PR to UV light.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dixit, Girish A San Jose, US 56 1805
Kanakasabapathy, Siva Krishnan Pleasanton, US 4 10
Singhal, Akhil N Portland, US 5 21
Smith, David C Lake Oswego, US 127 4272
van, Schravendijk Bart Jan Palo Alto, US 5 22

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