Method and apparatus for controlled ion implantation

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12247283
APP PUB NO 20230016122A1
SERIAL NO

17560529

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Abstract

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A method of operating a beamline ion implanter may include performing, in an ion implanter, a first implant procedure to implant a dopant of a first polarity into a given semiconductor substrate, and generating an estimated implant dose of the dopant of the first polarity based upon a set of filtered information, generated by the first implant procedure. The method may also include calculating an actual implant dose of the dopant of the first polarity using a predictive model based upon the estimated implant dose, and performing, in the ion implanter, an adjusted second implant procedure to implant a dopant of a second polarity into a select semiconductor substrate, based upon the actual implant dose.

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Patent Owner(s)

  • APPLIED MATERIALS INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Charnvanichborikarn, Supakit Gloucester, US 9 36
Eidukonis, Alexander K Amesbury, US 1 0
Gossmann, Hans-Joachim L Summit, US 14 29
Rodier, Dennis Francestown, US 6 48
Todorov, Stanislav S Topsfield, US 12 55
White, Richard Newmarket, US 123 1117
Zhao, Wei Lexington, US 814 5746
Zou, Wei Lexington, US 145 1287

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