Photoresist stripping composition

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12242198
APP PUB NO 20220365440A1
SERIAL NO

17634071

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Abstract

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A photoresist stripping composition comprising an organic amine and a method is provided. The photoresist stripping composition comprising an organic amine having the following formula (1).

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Patent Owner(s)

  • DOW GLOBAL TECHNOLOGIES LLC

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jiang, Xin Shanghai, CN 211 2822
King, Stephen W Braselton, US 121 535

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