Resist underlayer film-forming composition containing indolocarbazole novolak resin

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United States of America

PATENT NO 12242196
APP PUB NO 20230324802A1
SERIAL NO

18207934

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Abstract

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A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1):

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Patent Owner(s)

  • NISSAN CHEMICAL INDUSTRIES LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashimoto, Keisuke Toyama, JP 136 1174
Saito, Daigo Toyama, JP 32 278
Sakamoto, Rikimaru Toyama, JP 115 978
Tokunaga, Hikaru Toyama, JP 33 24

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