Method for manufacturing semiconductor device

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12237213
APP PUB NO 20240038584A1
SERIAL NO

17631932

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Abstract

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A method for manufacturing a semiconductor device. A photolithographic coating, including a first film, a photolithographic film, and a second film, is formed on the to-be-connected structure. Refractive indexes of the first film and the second film are smaller than 1. The photolithographic coating is exposed to a light having a first wavelength, to image the to-be-connected structure to a first region of the photolithographic film. The photolithographic coating is exposed to a light having a second wavelength through a mask, to image the mask to a second region of the photolithographic film. A region in which the first region and the second region overlap serves as a connection region corresponding to the to-be-connected structure, and thereby self-alignment between a layer of the to-be-connected structure and a layer where a contact hole is arranged is implemented.

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Patent Owner(s)

  • INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Song, Zhen Beijing, CN 201 1957
Wei, Yayi Beijing, CN 23 112
Zhang, Libin Beijing, CN 38 289

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